Catalytic Effect of SiO on Thermomigration of Impurities in SiO sub 2.
01 January 1989
We have found that encapsulated thin Si films, adjacent to SiO sub 2, are dissolved at elevated temperatures by a reaction: Si + SiO sub 2 -> 2SiO, with SiO diffusing through the silica network. The presence of SiO in SiO sub 2 in a concentration