Chromatography as a process tool in the characterization and quality control of resist materials.

This paper discusses the use of liquid chromatography (LC) as an aid in the analysis and design of resist materials. The paper is to be presented, as an invited talk, at the Micro- electronics Technical Symposium on Gas and Photoresist Contamination Control Technology sponsored by Millipore Corporation. The Symposium will be held in Santa Clara, California on May 21, 1984. The paper first describes LC techniques and then discusses the application of these techniques to resist materials and resist processing.