Evaluation of a 100 kV Thermal Field Emission Electron Beam Nanolithography System
01 November 2000
We report on the results of the factory acceptance testing of a JEOL model JBX 9300FSZ electron beam lithography system, a next generation spot beam lithography research tool. The system was tested for the criteria needed to excel in the areas of lithographic resolution, stability, exposure uniformity and pattern placement accuracy. We briefly describe the feature enhancedments over previous generation systems and present our detailed performance results.